Unique properties of a plasmon (MO effect, electro-optical effect) affect only a little the output light. A low propagation loss of plasmon is not as critical as in the case of the serial integration. A high coupling efficiency between plasmonic and Si waveguides is not as critical as in the case of the serial integration A combination of bridge-type and metal-stripe type of a plasmonic waveguide should be used. The etching by the Ar-milling should be used for for a metal microfibrication. It is similar to a ring resonator, where a ring is fabricated aside of a straight Si waveguide. Only a resonance coupling in/out of a plasmonic waveguide only affects the output. In this case the plasmonic waveguides is integrated aside of a Si waveguide and the direct propagation of light is not blocked in Si waveguide. Plasmonic waveguide near Si nanowire waveguide Propagation loss of plasmon should be minimized Coupling efficiency between plasmonic and Si waveguides should be maximized (difficult) Properties of a plasmon (MO effect, electro-optical effect) significantly influence the output light, because light can reach output only by excitation of a plasmon Lift-off process can be used for a metal microfibrication. The confinement by a metal stripe should be avoided. Wedge-, bridge- or grove- types of plasmonic waveguides should be used. Light can reach output only in a case when a plasmon is excited. In this case the plasmonic waveguides blocks the light propagation in Si nanowire waveguides. Use of wedge, bridge and similar designs of a plasmonic structures.ĭetails of the technology (2) are described hereġ) Type1: plasmonic waveguide blocks the direct propagation of light from input to output (See Fig.1)Ģ) Type 2: plasmonic waveguide in the vicinity of dielectric waveguide (technology 2) Lateral optical confinement out-of-metal edge. (technology 1) Looser out-of-plane confinement by a double-layer dielectric.ĭetails of the technology (1) are described here Important technologies for the integrated plasmonic: (3) a wide wavelength operational bandwidth Comparing to other designs of the integrated isolator, the plasmonic isolator may not provide the largest isolation and may not have a smallest insertion loss, but a very small size, a simple and compatible fabrication technology and a wide wavelength operational bandwidth makes the plasmonic isolator a good fit for the integration into the PIC (2) fabrication technology, which is well-compatible with the PIC What are merits of the plasmonic isolator? The conventional bulk isolator provides 30 dB of the isolation. It limits the maximum isolation ratio the plasmonic isolator may provide. (2) In order to minimize the insertion loss, the length of the plasmonic isolator should be shorten. Therefore, some insertion loss is unavoidable for the plasmonic isolator. (1) Unavoidable part of the plasmonic isolator is a metal, which absorbs light. What are demerits of the plasmonic isolator? The plasmonic isolator benefits from large magneto-optical constants of a ferromagnetic metal and the ability of a substantial enhancement of the magneto-optical effect using a plasmon (see here and here). The plasmonic isolator uses the unique non-reciprocal properties of plasmons, which propagates on a surface of a ferromagnetic metal. Only a magneto-optical material may have different optical properties Why the integration of the optical isolator is difficult?Īny design of the optical isolator should use a magneto-optical material. The back reflection can be suppressed by an optical isolator integrated between optical elements.Īt present, the most of optical elements (laser, detector, switch, modulator, amplifier) can be integrated in the Photonic Integrated Circuit(PIC), but not the isolator In a case of a dense integration the undesirable and unavoidable back reflection between different optical elements can severely disturb the operation of the Photonic Circuit. The integration of different optical elements on one substrate is important to make the Photonic Circuits to be more cheaper and to have more functions. Therefore, light is blocked and it can not reach the output fiber. In backward direction, a plasmon can not excited. In forward direction, a plasmon can excited and and light can reach from the input to output fiber. Enhancement of Transverse MO for plasmonsįig.1 Plasmonic isolator Co/TiO2/SiO2 integrated with Si nanowire waveguides click on image to enlarge it.Optical excitation of spin-polarized electrons utilizing transverse MO.Calculations of transverse MO effect in the case of multilayer structure.Two contributions to transverse MO effect.Experimental observation of transverse MO effect.Voltage- controlled magnetism (VCMA effect).Perpendicular magnetic anisotropy (PMA).Conduction in the vicinity of Interface.My Research and Inventions click here to see all content or button bellow for specific topic
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